Ultra-thin 3D Nano-Devices from Atomic Layer Deposition on Polyimide

被引：22

作者：

Eigenfeld, Nathan T. ^{[1
]}

Gray, Jason M. ^{[1
]}

Brown, Joseph J. ^{[1
]}

Skidmore, George D. ^{[3
]}

George, Steven M. ^{[1
,2
]}

Bright, Victor M. ^{[1
]}

机构：

[1] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA

[2] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA

[3] Network & Imaging Syst DRS ITS Texas Site, Dallas, TX 75243 USA

来源：

ADVANCED MATERIALS | 2014年 / 26卷 / 23期

关键词：

GAS-DIFFUSION BARRIERS; AL2O3; SILICON; GROWTH; FILMS; SIO2;

D O I：

10.1002/adma.201400410

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A new nanofabrication process for nano/micro-devices through the combination of inorganic nanomaterials from atomic layer deposition (ALD) on 3-dimensional organic polyimide substrates is developed. The first suspended ALD structures with multiple patterned suspended levels on the order of 10 nm are fabricated and results surrounding the mechanical stability of ultra-thin suspended structures are discussed.

引用

页码：3962 / 3967

页数：6