High-resolution primary ion beam probe for SIMS

被引：7

作者：

Guharay, SK

Douglass, S

Orloff, J

机构：

[1] FM Technol Inc, Chantilly, VA 20151 USA

[2] Univ Maryland, Inst Res Elect & Appl Phys, College Pk, MD 20742 USA

来源：

APPLIED SURFACE SCIENCE | 2004年 / 231卷

关键词：

plasma source; oxygen ions; high-resolution SIMS;

D O I：

10.1016/j.apsusc.2004.03.174

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

High-brightness negative ion beams, especially O- beams, from a compact gaseous plasma source are studied to evaluate the suitability for high-resolution SIMS. Ion-optical calculations are made using the beam parameters from the new source. Results suggest that sub-100 nm spot with O- beam current of 10 pA is achievable. Beam focusing, the resulting beam current distributions at the target and the expected instrumental performance are discussed. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：926 / 929

页数：4