共 18 条
- [1] Revised Pourbaix diagrams for iron at 25-300 degrees C [J]. CORROSION SCIENCE, 1996, 38 (12) : 2121 - 2135
- [3] Reliability of industrial packaging for microsystems [J]. MICROELECTRONICS RELIABILITY, 1998, 38 (6-8) : 1251 - 1260
- [4] HEIN A, 1997, P INT SOL STAT SENS, V1, P687
- [5] Effects of metal impurities on the etch rate selectivity (110)/(111) in (110) Si anisotropic etching [J]. MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY V, 1999, 3874 : 276 - 283
- [6] HIRATA Y, SPIE INT SOC OPTICAL
- [7] HOLMES PJ, 1956, P I ELECT ENG B S15, V106, P287
- [8] HOLMES PJ, 1960, P I ELECTR ENG, P287
- [9] Iron contamination in silicon technology [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 70 (05): : 489 - 534
- [10] LEISNER P, 1992, THESIS TU DENMARK LY