A Simple Method for Cleaning Graphene Surfaces with an Electrostatic Force

被引：30
|
作者：
Choi, Won Jin [1 ]
Chung, Yoon Jang [1 ]
Park, Serin [1 ]
Yang, Cheol-Soo [1 ]
Lee, Young Kuk [1 ]
An, Ki-Seok [1 ]
Lee, You-Seop [2 ]
Lee, Jeong-O [1 ]
机构：
[1] Korea Res Inst Chem Technol, Adv Mat Div, Taejon 305343, South Korea
[2] Samsung Elect, Ecosolut Team, DMC R&D Ctr, Suwon 443742, South Korea
来源：
ADVANCED MATERIALS | 2014年 / 26卷 / 04期
关键词：
graphene; cleaning; electrostatic forces; PMMA; LARGE-AREA; FILMS; RAMAN; TRANSPARENT; DOPANTS; TRIBO; OXIDE;
D O I：
10.1002/adma.201303199
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A facile method involving electrostatic forces is used to clean graphene surfaces that have been prepared through chemical vapor deposition (CVD). In this electrostatic-force cleaning (EFC) method, extremely fine cloth fibers are rubbed against CVD-grown graphene, in order to remove residual poly(methyl methacrylate) (PMMA), known as "PMMA-G," without damaging the graphene surface. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码：637 / 644
页数：8
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