A Simple Method for Cleaning Graphene Surfaces with an Electrostatic Force

被引：30

作者：

Choi, Won Jin ^{[1
]}

Chung, Yoon Jang ^{[1
]}

Park, Serin ^{[1
]}

Yang, Cheol-Soo ^{[1
]}

Lee, Young Kuk ^{[1
]}

An, Ki-Seok ^{[1
]}

Lee, You-Seop ^{[2
]}

Lee, Jeong-O ^{[1
]}

机构：

[1] Korea Res Inst Chem Technol, Adv Mat Div, Taejon 305343, South Korea

[2] Samsung Elect, Ecosolut Team, DMC R&D Ctr, Suwon 443742, South Korea

来源：

ADVANCED MATERIALS | 2014年 / 26卷 / 04期

关键词：

graphene; cleaning; electrostatic forces; PMMA; LARGE-AREA; FILMS; RAMAN; TRANSPARENT; DOPANTS; TRIBO; OXIDE;

D O I：

10.1002/adma.201303199

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A facile method involving electrostatic forces is used to clean graphene surfaces that have been prepared through chemical vapor deposition (CVD). In this electrostatic-force cleaning (EFC) method, extremely fine cloth fibers are rubbed against CVD-grown graphene, in order to remove residual poly(methyl methacrylate) (PMMA), known as "PMMA-G," without damaging the graphene surface. © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：637 / 644

页数：8

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