Hg1-xCdxTe (MCT) epitaxial layers were grown on (110) CdTe, (110) CdZnTe and (110) CdTeSe substrates by the Isothermal Vapor Phase Epitaxy (ISO VPE) method with no aditional Hg. CdZnTe and CdTeSe substrates have been used to achieve a closer lattice math with MCT. Furthermore these substrates usually have lower dislocation density. Epitaxial MCT is an important material for advanced detectors. As the structural defects in MCT layers are major limiting factors for device fabrication, it is highly desirable to improve their crystalline qualify. The characterization of MCT layers include optical and scanning electron microscopies, chemical etching, X-ray diffraction, electron microprobe with the wave length dispersive spectroscopic mode, and Hall effect measurements.
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Univ Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, SpainUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Rubio, Sandra
Sochinskii, Nikolai V.
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Univ Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, SpainUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Sochinskii, Nikolai V.
Repiso, Eva
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Univ Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, SpainUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Repiso, Eva
Tsybrii, Zinoviia
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Inst Semicond Phys, UA-03028 Kiev, UkraineUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Tsybrii, Zinoviia
Sizov, Fiodor
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Inst Semicond Phys, UA-03028 Kiev, UkraineUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Sizov, Fiodor
Luis Plaza, Jose
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Univ Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, SpainUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
Luis Plaza, Jose
Dieguez, Ernesto
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Univ Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, SpainUniv Autonoma Madrid, Fac Sci, Dept Mat Phys, Crystal Growth Lab, Ciudad Univ Cantoblanco, E-28049 Madrid, Spain
机构:
Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R ChinaChinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China
Wu, Y
Yu, MF
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机构:Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China
Yu, MF
Chen, L
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机构:Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China
Chen, L
Qiao, YM
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机构:Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China
Qiao, YM
Yang, JR
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机构:Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China
Yang, JR
He, L
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机构:Chinese Acad Sci, Shanghai Inst Tech Phys, Res Ctr Adv Mat & Devices, Shanghai 200083, Peoples R China