Interaction of oxygen vacancies with domain walls and its impact on fatigue in ferroelectric thin films

被引:7
作者
Xiao, Y [1 ]
Bhattacharya, K [1 ]
机构
[1] CALTECH, Div Engn & Appl Sci, Pasadena, CA 91125 USA
来源
SMART STRUCTURES AND MATERIALS 2004: ACTIVE MATERIALS: BEHAVIOR AND MECHANICS | 2004年 / 5387卷
关键词
ferroelectric thin film; wide band-gap semiconductor; oxygen vacancy; fatigue; domain wall;
D O I
10.1117/12.539588
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The role of oxygen vacancies in fatigue and dielectric breakdown has been a topic of intense research in ferroelectric perovskites like BaTiO3. This paper presents a comprehensive model that treats the ferroelectrics as polarizable wide band-gap semiconductors where the oxygen vacancies act as donors. First, a fully coupled nonlinear model is developed with space charges, polarization, electric potential and elastic displacements as variables without making any a priori assumptions on the space charge distribution and the polarization. Second, a Pt/BaTiO3/Pt structure is considered. Full-field coupled numerical simulations are used to investigate the structure of 180degrees and 90degrees domain walls in both perfect and defected crystals. The interactions of oxygen vacancies with domain walls are explored. Numerical results show that there is pronounced charge trapping near 90degrees domain walls, giving rise to possible domain wall pinning and dielectric breakdown. Third, a simple analytical solution of the potential profile for a metal/ferroelectric semiconductor interface is obtained and the depletion layer width is estimated. These analytical estimates agree with our numerical results and provide a useful tool to discuss the implications of our results.
引用
收藏
页码:354 / 365
页数:12
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