Enhanced anomalous Hall effect in Fe nanocluster assembled thin films

An enhanced anomalous Hall effect is observed in heterogeneous uniform Fe cluster assembled films with different film thicknesses (t(a) = 160-1200 nm) fabricated by a plasma-gas-condensation method. The anomalous Hall coefficient (R-s) at t(a) = 1200 nm reaches its maximum of 2.4 x 10(-8) Omega cm G(-1) at 300 K, which is almost four orders of magnitude larger than bulk Fe. The saturated Hall resistivity (rho(A)(XY)) first increases and then decreases with the increase of temperature accompanied by a sign change from positive to negative. Analysis of the results revealed that rho(A)(XY) decreases with increasing longitudinal resistivity (rho(XX)) on a double-logarithmic scale and obeys a new scaling relation of log(rho(A/)(XY)rho(XX)) = a(0) + b(0) log rho(XX).