High-frequency SiGe-n-MODFET for microwave applications

被引:25
作者
Zeuner, M [1 ]
Hackbarth, T
Höck, G
Behammer, D
König, U
机构
[1] Daimler Chrysler Res Ctr, D-89081 Ulm, Germany
[2] Univ Ulm, Dept Electron Devices & Circuits, D-89081 Ulm, Germany
来源
IEEE MICROWAVE AND GUIDED WAVE LETTERS | 1999年 / 9卷 / 10期
关键词
n-MODFET; Si/SiGe; 2DEG;
D O I
10.1109/75.798032
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
n-type SiGe modulation-doped hetero field-effect transistors (MODFET's) with a 0.25-mu m Schottky-gate on a Si0.55Ge0.45 buffer are presented. The layer structure was designed to enable elevated sheet carrier densities of n(s) = 7.0 x 10(12) cm(-2) at moderate electron mobilities of 1050 cm(2)/Vs. Reducing the thickness of the cap layers enhances the control of the gate on the 2DEG and leads to a high transconductance of 320 mS/mm, Targeting analog applications we focused on large current densities around 400 mA/mm, Due to advanced RF-characteristics the 100-GHz hurdle of f(max) was passed for the first time with f(max)(U) = 120 GHz and Si was determined at 42 GHz.
引用
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页码:410 / 412
页数:3
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