Plasma emission characteristics in laser-induced breakdown spectroscopy of silicon with mid-infrared, multi-millijoule, nanosecond laser pulses from a Ho:YLF excitation source

被引：1

作者：

Kupfer, Rotem ^{[1
]}

Quevedo, Hernan J. ^{[1
]}

Smith, Herbie L. ^{[1
]}

Ha, Thanh N. ^{[1
]}

Yandow, Andrew ^{[1
]}

Tiwari, Ganesh ^{[1
]}

Richmond, C. Grant ^{[1
]}

Fang, Li ^{[1
]}

Hegelich, B. Manuel ^{[1
,2
]}

机构：

[1] Univ Texas Austin, Ctr High Energy Dens Sci, Dept Phys, Austin, TX 78712 USA

[2] Inst Basic Sci, Ctr Relativist Laser Sci, Gwangju 500712, South Korea

来源：

APPLIED OPTICS | 2019年 / 58卷 / 17期

关键词：

ABLATION; TEMPERATURE; DIAGNOSTICS; LIBS; AIR;

D O I：

10.1364/AO.58.004592

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We characterized the plasma emission produced by the interaction of multi-millijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera, we observed a spatial separation of the plasma plume, increased emission signal with low white-light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our results can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths. (C) 2019 Optical Society of America

引用

页码：4592 / 4598

页数：7

共 20 条

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