Modelling of DNA damage induced by energetic electrons (100 eV to 100 keV)

被引:106
作者
Nikjoo, H [1 ]
Bolton, CE
Watanabe, R
Terrissol, M
O'Neill, P
Goodhead, DT
机构
[1] MRC, Radiat & Genom Stabil Unit, Harwell OX11 0RD, Berks, England
[2] JAERI, Radiat Risk Anal Lab, Tokai, Ibaraki, Japan
[3] Univ Toulouse 3, CPAT, Toulouse, France
关键词
D O I
10.1093/oxfordjournals.rpd.a006843
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Modelling and calculations are presented for the spectrum of initial DNA damage produced by 100 eV to 100 keV energetic electrons. Analysis of the initial spectrum of damage. based upon the source (direct energy deposition and reactions with diffusing OH radicals) and complexity of damage. indicates that tire majority of tire interactions cause no damage to DNA and any damage that does occur is most likely to be a simple single strand break (SSB). The fraction of complex damage for energetic electrons is lower than that induced by lock energy electrons and ultrasoft X rays but still represents an appreciable fraction (20-30%) of tire total double strand breaks (DSBs). Relative yields of strand breaks are investigated for dependence on the assumed energy deposition threshold and (in the probability of the hydroxyl radicals to produce a single strand break. The ratio of direct to indirect damage does not change significantly across the electron energy range investigated and the values lie well within tire experimental data. The direct energy deposition in DNA represents a larger proportion of tire damage although the contribution from the hydroxyl radicals is also substantial, both in terms of the absolute yield of the breaks and the complexity of the damage.
引用
收藏
页码:77 / 80
页数:4
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