BiFeO3-doped (K0.5,Na0.5)(Mn0.005,Nb0.995)O3 ferroelectric thin film capacitors for high energy density storage applications

被引:70
作者
Won, Sung Sik [1 ]
Kawahara, Masami [2 ]
Kuhn, Lindsay [1 ]
Venugopal, Vineeth [1 ]
Kwak, Jiyeon [3 ]
Kim, Ill Won [4 ,5 ]
Kingon, Angus I. [1 ]
Kim, Seung-Hyun [1 ]
机构
[1] Brown Univ, Sch Engn, Providence, RI 02912 USA
[2] Kojundo Chem Lab Co Ltd, Sakado, Saitama 3500284, Japan
[3] Inha Univ, Coll Med, Dept Physiol & Biophys, Incheon 402752, South Korea
[4] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[5] Univ Ulsan, Energy Harvest Storage Res Ctr, Ulsan 680749, South Korea
基金
美国国家科学基金会;
关键词
PERFORMANCE; DEVICES;
D O I
10.1063/1.4980113
中图分类号
O59 [应用物理学];
学科分类号
摘要
Environmentally benign lead-free ferroelectric (K-0.5,Na-0.5)(Mn-0.005,Nb-0.995)O-3 (KNMN) thin film capacitors with a small concentration of a BiFeO3 (BF) dopant were prepared by a cost effective chemical solution deposition method for high energy density storage device applications. 6 mol. % BF-doped KNMN thin films showed very slim hysteresis loops with high maximum and near-zero remanent polarization values due to a phase transition from the orthorhombic structure to the pseudo-cubic structure. Increasing the electric field up to 2 MV/cm, the total energy storage density (J(total)), the effective recoverable energy density (J(eff)), and the energy conversion efficiency (g) of lead-free KNMN-BF thin film capacitors were 31.0 J/cm(3), 28.0 J/cm(3), and 90.3%, respectively. In addition, these thin film capacitors exhibited a fast discharge time of a few mu s and a high temperature stability up to 200 degrees C, proving their strong potential for high energy density storage and conversion applications. Published by AIP Publishing.
引用
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页数:5
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