Atomic layer deposition to fine-tune the surface properties and diameters of fabricated nanopores

被引：363

作者：

Chen, P

Mitsui, T

Farmer, DB

Golovchenko, J

Gordon, RG

Branton, D ^{[1
]}

机构：

[1] Harvard Univ, Dept Mol & Cellular Biol, Dept Phys, Div Engn & Appl Sci, Cambridge, MA 02138 USA

[2] Harvard Univ, Dept Chem & Chem Biol, Cambridge, MA 02138 USA

来源：

NANO LETTERS | 2004年 / 4卷 / 07期

关键词：

D O I：

10.1021/nl0494001

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Atomic layer deposition of alumina enhanced the molecule sensing characteristics of fabricated nanopores by fine-tuning their surface properties, reducing 1/f noise, neutralizing surface charge to favor capture of DNA and other negative polyelectrolytes, and controlling the diameter and aspect ratio of the pores with near single Angstrom precision. The control over the chemical and physical nature of the pore surface provided by atomic layer deposition produced a higher yield of functional nanopore detectors.

引用

收藏

页码：1333 / 1337

页数：5

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