Electron-beam lithography to improve quality of computer-generated hologram

被引:4
作者
Gao, F [1 ]
Zhu, JH
Huang, QZ
Zhang, YX
Zeng, YS
Gao, FH
Guo, YK
Cui, Z
机构
[1] Sichuan Univ, Dept Phys, Chengdu 610064, Peoples R China
[2] Rutherford Appleton Lab, Didcot OX11 0QX, Oxon, England
关键词
computer generated hologram; electron beam lithography;
D O I
10.1016/S0167-9317(02)00570-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The quantized errors in computer generated holograms (CGH) have been analysed theoretically. In order to evaluate quantitatively the influence of these errors on the quality of reconstructed image, a signal-to-noise ratio (SNR) is introduced. It is found that the SNR of a reconstructed image is very sensitive to the accuracy of amplitude and phase. Improving the accuracy of amplitude and phase is much more effective for improvement of CGH image quality than simply increasing the sampling cells. The accuracy of amplitude and phase of a sampling cell is represented by the fidelity of sampling cell geometry. CGH plates with the same encoded image have been fabricated by both conventional photoreduction method and e-beam direct write method. The reconstructed images from both plates have been compared. The experimental result has confirmed the theoretical analysis: e-beam direct write can produce CGHs with quality superior to conventional photoreduction technique (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:363 / 369
页数:7
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