A double-stream Xe:He jet plasma emission in the vicinity of 6.7 nm

被引：18

作者：

Chkhalo, N. I. ^{[1
]}

Garakhin, S. A. ^{[1
]}

Golubev, S. V. ^{[2
]}

Lopatin, A. Ya. ^{[1
]}

Nechay, A. N. ^{[1
]}

Pestov, A. E. ^{[1
]}

Salashchenko, N. N. ^{[1
]}

Toropov, M. N. ^{[1
]}

Tsybin, N. N. ^{[1
]}

Vodopyanov, A. V. ^{[2
]}

Yulin, S. ^{[3
]}

机构：

[1] RAS, Inst Phys Microstruct, Nizhnii Novgorod 603950, Russia

[2] RAS, Inst Appl Phys, Nizhnii Novgorod 603950, Russia

[3] Fraunhofer Inst Appl Opt & Precis Engn IOF, Albert Einstein Str 7, D-07745 Jena, Germany

来源：

APPLIED PHYSICS LETTERS | 2018年 / 112卷 / 22期

基金：

俄罗斯科学基金会;

关键词：

GAS PUFF TARGET; X-RAY-EMISSION; EXTREME-ULTRAVIOLET LITHOGRAPHY; ND-YAG LASER; RANGE; METROLOGY;

D O I：

10.1063/1.5016471

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present the results of investigations of extreme ultraviolet (EUV) light emission in the range from 5 to 10 nm. The light source was a pulsed "double-stream" Xe:He gas jet target irradiated by a laser beam with a power density of similar to 10(11) W/cm(2). The radiation spectra were measured with a Czerny-Turner monochromator with a plane diffraction grating. The conversion efficiency of the laser energy into EUV radiation caused by Xe+14...+16 ion emission in the range of 6-8 nm was measured using a calibrated power meter. The conversion efficiency of the laser radiation into EUV in the vicinity of 6.7 nm was (2.17 +/- 0.13)% in a 1 nm spectral band. In the spectral band of the real optical system (0.7% for La/B multilayer mirrors) emitted into the half-space, it was (0.1 +/- 0.006)%. The results of this study provide an impetus for further research on laser plasma sources for maskless EUV lithography at a wavelength of 6.7 nm. Published by AIP Publishing.

引用

页数：4

共 25 条

[1] Silicon photodiode with selective Zr/Si coating for extreme ultraviolet spectral range
Aruev, P. N.
Barysheva, M. M.
Ber, B. Ya
Zabrodskaya, N. V.
Zabrodskii, V. V.
Lopatin, A. Ya
Pestov, A. E.
Petrenko, M. V.
Polkovnikov, V. N.
Salashchenko, N. N.
Sukhanov, V. L.
Chkhalo, N. I.
[J]. QUANTUM ELECTRONICS, 2012, 42 (10) : 943 - 948
[2] Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft X-ray region
Bibishkin, MS
Chekhonadskih, DP
Chkhalo, NI
Kluyenkov, EB
Pestov, AE
Salashchenko, NN
Shmaenok, LA
Zabrodin, IG
Zuev, SY
[J]. MICRO- AND NANOELECTRONICS 2003, 2004, 5401 : 8 - 15
[3] Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics
Chkhalo, N. I.
Salashchenko, N. N.
[J]. AIP ADVANCES, 2013, 3 (08):
[4] Source for extreme ultraviolet lithography based on plasma sustained by millimeter-wave gyrotron radiation
Chkhalo, Nikolay I.
Golubev, Sergei V.
Mansfeld, Dmitry
Salashchenko, Nikolay N.
Sjmaenok, Leonid A.
Vodopyanov, Alexander V.
[J]. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02):
[5] Maskless extreme ultraviolet lithography
Choksi, N
Pickard, DS
McCord, M
Pease, RFW
Shroff, Y
Chen, YJ
Oldham, W
Markle, D
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 3047 - 3051
[6] EUV spectra of Gd and Tb ions excited in laser-produced and vacuum spark plasmas
Churilov, S. S.
Kildiyarova, R. R.
Ryabtsev, A. N.
Sadovsky, S. V.
[J]. PHYSICA SCRIPTA, 2009, 80 (04)
[7] Compact laser plasma EUV source based on a gas puff target for metrology
Fiedorowicz, H
Bartnik, A
Jarocki, R
Kostecki, J
Krzywinski, J
Mikolajczyk, J
Rakowski, R
Szczurek, A
Szczurek, M
[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2005, 401 (1-2) : 99 - 103
[8] Investigation of soft X-ray emission from a gas puff target irradiated with a Nd:YAG laser
Fiedorowicz, H
Bartnik, A
Szczurek, H
Daido, H
Sakaya, N
Kmetik, V
Kato, Y
Suzuki, M
Matsumura, M
Tajima, J
Nakayama, T
Wilhein, T
[J]. OPTICS COMMUNICATIONS, 1999, 163 (1-3) : 103 - 114
[9] X-RAY-EMISSION FROM LASER-IRRADIATED GAS PUFF TARGETS
FIEDOROWICZ, H
BARTNIK, A
PATRON, Z
PARYS, P
[J]. APPLIED PHYSICS LETTERS, 1993, 62 (22) : 2778 - 2780
[10] Enhanced X-ray emission in the 1-keV range from a laser-irradiated gas puff target produced using the double-nozzle setup
Fiedorowicz, H
Bartnik, A
Jarocki, R
Rakowski, R
Szczurek, M
[J]. APPLIED PHYSICS B-LASERS AND OPTICS, 2000, 70 (02): : 305 - 308

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