Emission spectra of laser-produced plasmas for EUV and soft X-ray sources

被引：0

作者：

Soumagne, G ^{[1
]}

Abe, T ^{[1
]}

Ikeda, K ^{[1
]}

Komori, H ^{[1
]}

Someya, H ^{[1
]}

Suganuma, T ^{[1
]}

Nakajima, K ^{[1
]}

Endo, A ^{[1
]}

机构：

[1] Extreme Ultraviolet Litho Syst Dev Assoc, EUVA, Hiratsuka Res & Dev Ctr, Hiratsuka, Kanagawa 2548567, Japan

来源：

LASER OPTICS 2003: SUPERINTENSE LIGHT FIELDS AND ULTRAFAST PROCESSES | 2003年 / 5482卷

关键词：

EUV emission; laser-produced plasma; solid target; plasma emission;

D O I：

10.1117/12.558598

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The plasma emission of tin, aluminum and cupper targets irradiated with laser intensities ranging from 10(11) to 10(16) W/cm(2) has been measured between 7 nm and 18 nm. A chirped pulse amplified Ti:Sapphire laser oscillating at 790 nm with either 100 fs or 300 ps pulse duration and a Nd:YAG laser oscillating at 1064 nm with 10 ns pulse duration (fwhm) have been used. The observed plasma emission was strongest for the 300 ps laser pulse irradiation, which might be due to the additional laser plasma heating during plasma formation.

引用

页码：26 / 31

页数：6