808 nm high-power laser grown by MBE through the control of Be diffusion and use of superlattice

被引:1
作者
Zhu, DH
Wang, ZG
Liang, JB
Xu, B
Zhu, ZP
Zhang, J
Gong, Q
Li, SY
机构
[1] Lab. of Semiconduct. Mat. Science, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083
关键词
high-power; semiconductor laser; MBE; quantum well;
D O I
10.1016/S0022-0248(96)01018-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
808 nm high-power laser diodes are gown by MBE. In the laser structure, the combination of Si-doped GRIN (graded-index) region adjacent to n-AlGaAs cladding layer with reduced Be doping concentration near the active region has been used to diminish Be diffusion and oxygen incorporation. As compared with the laser structure which has undoped GRIN region and uniform doping concentration for Si and Be, respectively, in the cladding layers, the slope efficiency has increased by about 8%. Typical threshold current density of 300 A/cm(2) and the minimum threshold current density of 220 A/cm(2) for lasers with 500 mu m cavity length are obtained. A high slope efficiency of 1.3 W/A for coated lasers with 1000 mu m cavity length is also demonstrated, Recorded CW output power at room temperature has reached 2.3 W.
引用
收藏
页码:1004 / 1008
页数:5
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