Kinetic analysis of the initiated chemical vapor deposition of poly(vinylpyrrolidone) and poly(4-vinylpyridine)

被引：18

作者：

Janakiraman, Sruthi ^{[1
]}

Farrell, Steven L. ^{[1
]}

Hsieh, Chia-Yun ^{[1
]}

Smolin, Yuriy Y. ^{[1
]}

Soroush, Masoud ^{[1
]}

Lau, Kenneth K. S. ^{[1
]}

机构：

[1] Drexel Univ, Dept Chem & Biol Engn, Philadelphia, PA 19104 USA

来源：

THIN SOLID FILMS | 2015年 / 595卷

基金：

美国国家科学基金会;

关键词：

Initiated chemical vapor deposition; Vinylpyrrolidone; 4-Vinylpyridine; Polymer; Thin films; Free radical polymerization; Kinetic analysis; Adsorption-limited deposition rate; SENSITIZED SOLAR-CELLS; THIN-FILMS; POLYMER-ELECTROLYTE; POLYVINYLPYRROLIDONE; ICVD; BIOCOMPATIBILITY; PERFORMANCE; ACRYLATES); EFFICIENCY;

D O I：

10.1016/j.tsf.2015.04.083

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Initiated chemical vapor deposition (iCVD) is used to deposit poly(vinylpyrrolidone) (PVP) and poly(4-vinylpyridine) (P4VP). Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and gel permeation chromatography were used to confirm the deposition of the polymers. Reactor conditions, including gas pressure and substrate temperature, were varied to determine the effect on the deposition rate of the polymer. The rate of reaction was found to increase with increasing pressure and decrease with increasing substrate temperature. Understanding the kinetics of the reaction provides a basis for applications of PVP and P4VP thin films in dye sensitized solar cells and other alternative energy applications. (C) 2015 Elsevier B.V. All rights reserved.

引用

页码：244 / 250

页数：7

共 31 条

[1] Poly(4-vinylpyridine) and poly(4-vinylpyridine poly-3-oxide ethylene) as corrosion inhibitors for Cu60-Zn40 in 0.5M HNO3 [J].