Quantifying the impact of proximity error correction on plasmonic metasurfaces [Invited]

被引:17
作者
Schulz, Sebastian A. [1 ]
Upham, Jeremy [1 ]
Bouchard, Frederic [1 ]
De Leon, Israel [1 ]
Karimi, Ebrahim [1 ]
Boyd, Robert W. [1 ,2 ,3 ]
机构
[1] Univ Ottawa, Dept Phys, Ottawa, ON K1N 6N5, Canada
[2] Univ Rochester, Inst Opt, Rochester, NY 14627 USA
[3] Univ Rochester, Dept Phys & Astron, Rochester, NY 14627 USA
来源
OPTICAL MATERIALS EXPRESS | 2015年 / 5卷 / 12期
关键词
ORBITAL ANGULAR-MOMENTUM;
D O I
10.1364/OME.5.002798
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Plasmonic metasurfaces are often limited in their application by poor device performance, which is caused - in part - by deviations between fabricated devices and the ideal design. We show in this letter that these deviations are reduced significantly by shape-correction, intra-structure proximity error correction. We show experimentally that the fabrication fidelity alone is not a good indicator of the device quality and that direct measurements of the optical performance are necessary. Our fabrication improvements result in increased optical performance, reaching a measurement fidelity as high as 90%. (C) 2015 Optical Society of America
引用
收藏
页码:2798 / 2803
页数:6
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