Hot-carrier NMOST degradation at periodic drain signal

被引:0
|
作者
Habas, P [1 ]
机构
[1] Philips Semicond, NL-6534 AE Nijmegen, Netherlands
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Hot-carrier-induced NMOST degradation is considered for periodic drain-source signal. A general lifetime relationship is derived on the basis of quasi-static approximation and a lifetime model for DC condition. Two practical cases are discussed: sinusoidal drain signal from 0V to V-DD (circuit supply) and trapezoidal signal from 0V to V-DD. (in special case, it reduces to triangular waveform). Compact, practically useful, formulas are proposed. The model for AC conditions is based on the same physical approximations that are traditionally used in the derivation of physically crude, but well applicable lifetime models in DC conditions. A strategy is proposed for building-in HC-reliability of NMOSFET subjected to a periodic large drain-signals in analog circuits.
引用
收藏
页码:731 / 734
页数:4
相关论文
共 50 条
  • [31] Modeling of Hot-Carrier Degradation: Physics and Controversial Issues
    Tyaginov, Stanislav
    Grasser, Tibor
    2012 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP FINAL REPORT, 2012, : 206 - 215
  • [32] Hot-Carrier Degradation modeling of DCR drift in SPADs
    Sicre, Mathieu
    Roy, David
    Calmon, Francis
    IEEE 53RD EUROPEAN SOLID-STATE DEVICE RESEARCH CONFERENCE, ESSDERC 2023, 2023, : 61 - 64
  • [33] Temperature effects on the hot-carrier induced degradation of pMOSFETs
    Chen, Shuang-Yuan
    Tu, Chia-Hao
    Lin, Jung-Chun
    Kao, Po-Wei
    Lin, Wen-Cheng
    Jhou, Ze-Wei
    Chou, Sam
    Ko, Joe
    Haung, Heng-Sheng
    2006 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP, FINAL REPORT, 2006, : 163 - +
  • [34] Coupling between hot-carrier degradation modes of pMOSFETs
    Janapaty, V
    Bhuva, B
    Bui, N
    Kerns, S
    MICROELECTRONIC MANUFACTURING YIELD, RELIABILITY, AND FAILURE ANALYSIS III, 1997, 3216 : 145 - 148
  • [35] Hot-carrier degradation in deep-submicrometer nMOSFETs:: lightly doped drain vs. large angle tilt implanted drain
    Rafí, JM
    Campabadal, F
    SOLID-STATE ELECTRONICS, 2001, 45 (08) : 1391 - 1401
  • [36] Physics-Based Hot-Carrier Degradation Models
    Tyaginov, S. E.
    Starkov, I. A.
    Enichlmair, H.
    Park, J. M.
    Jungemann, Ch.
    Grasser, T.
    SILICON NITRIDE, SILICON DIOXIDE, AND EMERGING DIELECTRICS 11, 2011, 35 (04): : 321 - 352
  • [37] Hot-carrier degradation analysis based on ring oscillators
    Wang, Jingchao
    Olthof, Edgar
    Metselaar, Wim
    MICROELECTRONICS RELIABILITY, 2006, 46 (9-11) : 1858 - 1863
  • [38] Physical Modeling of Hot-Carrier Degradation in nLDMOS Transistors
    Wimmer, Y.
    Tyaginov, S.
    Rudolf, F.
    Rupp, K.
    Bina, M.
    Enichlmair, H.
    Park, J. -M.
    Minixhofer, R.
    Ceric, H.
    Grasser, T.
    2014 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP FINAL REPORT (IIRW), 2014, : 58 - 62
  • [39] Towards understanding recovery of hot-carrier induced degradation
    de Jong, Maurits J.
    Salm, Cora
    Schmitz, Jurriaan
    MICROELECTRONICS RELIABILITY, 2018, 88-90 : 147 - 151
  • [40] Precise quantitative evaluation of the hot-carrier induced drain series resistance degradation in LATID-n-MOSFETs
    Walter, GH
    Weber, W
    Brederlow, R
    Jurk, R
    Linnenbank, CG
    Schlunder, C
    Schmitt-Landsiedel, D
    Thewes, R
    MICROELECTRONICS RELIABILITY, 1998, 38 (6-8) : 1063 - 1068