DEPOSITION OF THIN-FILM COATING WITH USE OF CLUSTER BEAM SOURCE

The experimental results of researches of thin films obtained by a deposition of a cluster beam onto silicon substrates are submitted in the work. For synthesis of the films the source of a cluster beam with laser vaporization was used. Metallized clusters in the flows of inert and reactive gases were synthesized. The growth of thin films Ag and Zn on the surface of Si (100) substrate under different conditions, was studied with usage of a electron-microscope and Rutherford backscattering. The comparison of crystal grain sizes of synthesized films measured by various methods was carried out.