Strain and composition of capped Ge/Si self-assembled quantum dots grown by chemical vapor deposition

被引:36
|
作者
Patriarche, G
Sagnes, I
Boucaud, P
Le Thanh, V
Bouchier, D
Hernandez, C
Campidelli, Y
Bensahel, D
机构
[1] Lab Concepts & Disposit Photon, CNRS, URA 250, F-92225 Bagneux, France
[2] Univ Paris 11, Inst Elect Fondamentale, CNRS, UMR 8622, F-91405 Orsay, France
[3] France Telecom, F-38243 Meylan, France
关键词
D O I
10.1063/1.126979
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the composition and the strain profile of Ge/Si self-assembled quantum dots. The quantum dots, grown by low-or high-pressure chemical vapor deposition, were covered by a silicon cap layer. The composition and the strain were measured by the selected area transmission electron diffraction of a single quantum dot. The self-assembled quantum dots exhibit a quadratic deformation. No lateral relaxation of the lattice is observed from the main part of the quantum dot. An average composition of Ge around 50% is deduced. The average composition is found dependent on the size of the islands. This composition is correlated to the photoluminescence energy. (C) 2000 American Institute of Physics. [S0003-6951(00)01129-3].
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收藏
页码:370 / 372
页数:3
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