Electrical behavior of β-Ga2O3 Schottky diodes with different Schottky metals

被引:167
作者
Yao, Yao [1 ]
Gangireddy, Raveena [1 ]
Kim, Jaewoo [1 ]
Das, Kalyan Kumar [2 ]
Davis, Robert F. [1 ]
Porter, Lisa M. [1 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, 5000 Forbes Ave, Pittsburgh, PA 15213 USA
[2] JBP Mat, Morrisville, NC 27560 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2017年 / 35卷 / 03期
基金
美国国家科学基金会;
关键词
BARRIER HEIGHT; VOLTAGE; GROWTH;
D O I
10.1116/1.4980042
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Schottky diodes based on ((2) over bar 01) beta-Ga2O3 substrates and (010) beta-Ga2O3 homoepitaxial layers were formed using five different Schottky metals: W, Cu, Ni, Ir, and Pt. Based on a comparison of the effects of different wet chemical surface treatments on the Ga2O3 Schottky diodes, it was established that a treatment with an organic solvent, cleaning with HCl and H2O2, and rinsing with deionized water following each step yielded the best results. Schottky barrier heights calculated from current-voltage (I-V) and capacitance-voltage (C-V) measurements of the five selected metals were typically in the range of 1.0-1.3 and 1.6-2.0 eV, respectively, and showed little dependence on the metal work function. Several diodes also displayed inhomogeneous Schottky barrier behavior at room temperature. The results indicate that bulk or near-surface defects and/or unpassivated surface states may have a more dominant effect on the electrical behavior of these diodes compared to the choice of Schottky metal and its work function. (C) 2017 American Vacuum Society.
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页数:7
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