High-frequency noise of modern MOSFETs: Compact modeling and measurement issues

被引:89
作者
Deen, M. Jamal [1 ]
Chen, Chih-Hung
Asgaran, Sarnan
Rezvani, G. Ali
Tao, Jon
Kiyota, Yukihiro
机构
[1] McMaster Univ, Dept Elect Commun Engn, Hamilton, ON L8S 4K1, Canada
[2] RFMD, Scotts Valley, CA 95066 USA
[3] Sony Corp, Semicond Business Unit, Semicond Technol Dev Grp, Analog & RF Device Dev Dept, Kanagawa 2430014, Japan
基金
加拿大自然科学与工程研究理事会;
关键词
compact noise modeling; HF noise; HF noise measurement; MOS noise; noise modeling; noise parameters; RF CMOS noise; RF compact MOS noise models; RF MOS transistor noise; RF noise; RF noise deembedding; RF noise measurement;
D O I
10.1109/TED.2006.880370
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Compact modeling of the most important high-frequency (HF) noise sources of the MOSFET is presented in this paper, along with challenges in noise measurement and deembedding of future CMOS technologies. Several channel thermal noise models are reviewed and their ability to predict the channel noise of extremely small devices is discussed. The impact of technology scaling on noise performance of MOSFETs is also investigated by means of analytical expressions. It is shown that the gate tunneling current has a significant impact on MOSFETs noise parameters, especially at lower frequencies. Limitations of some commonly used noise models in predicting the HF noise parameters of modern MOSFETs are addressed and methods to alleviate some of the limitations are discussed.
引用
收藏
页码:2062 / 2081
页数:20
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