Fabrication techniques for grating-based optical devices

被引：21

作者：

Lim, MH ^{[1
]}

Murphy, TE ^{[1
]}

Ferrera, J ^{[1
]}

Damask, JN ^{[1
]}

Smith, HI ^{[1
]}

机构：

[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590981

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We describe a novel, versatile process for fabricating integrated Bragg-grating devices. Our process addresses many of the critical challenges presented by such devices, including period selection, alignment, spatial coherence, and nanolithography. Using a combination of a-beam, x-ray, optical, and interference lithographies, we have successfully employed this process to construct 244 nm period, quarter-wave-shifted Bragg gratings on top of 1-mu m-tall waveguide structures in InP. (C) 1999 American Vacuum Society. [S0734-211X(99)07206-6].

引用

页码：3208 / 3211

页数：4

共 9 条

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