Atomic scale memory at a silicon surface

被引:89
作者
Bennewitz, R
Crain, JN
Kirakosian, A
Lin, JL
McChesney, JL
Petrovykh, DY
Himpsel, FJ
机构
[1] Univ Wisconsin, Dept Phys, Madison, WI 53706 USA
[2] Univ Basel, Dept Phys & Astron, CH-4056 Basel, Switzerland
关键词
D O I
10.1088/0957-4484/13/4/312
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The limits of pushing storage density to the atomic scale are explored with a memory that stores a bit by the presence or absence of one silicon atom. These atoms are positioned at lattice sites along self-assembled tracks with a pitch of five atom rows. The memory can be initialized and reformatted by controlled deposition of silicon. The writing process involves the transfer of Si atoms to the tip of a scanning tunnelling microscope. The constraints on speed and reliability are compared with data storage in magnetic hard disks and DNA.
引用
收藏
页码:499 / 502
页数:4
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