Two-photon absorption towards pulse modulation in mechanically exfoliated and CVD monolayer cascaded MoS2 structures

被引：4

作者：

Xie, Yafeng ^{[1
,2
]}

Zhang, Saifeng ^{[1
]}

Zhang, Xiaoyan ^{[1
]}

Dong, Ningning ^{[1
]}

Kislyakov, Ivan M. ^{[1
]}

Luo, Song ^{[3
]}

Chen, Zhanghai ^{[3
]}

Nunzi, Jean-Michel ^{[1
,4
,5
]}

Zhang, Long ^{[1
]}

Wang, Jun ^{[1
,6
]}

机构：

[1] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab Micronano Photon & Optoelect Mat & Devices, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China

[2] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

[3] Fudan Univ, Collaborat Innovat Ctr Adv Microstruct, State Key Lab Surface Phys, Minist Educ,Dept Phys,Key Lab Micro & Nano Photon, Shanghai 200433, Peoples R China

[4] Queens Univ, Dept Phys Engn Phys & Astron, Kingston, ON K7L 3N6, Canada

[5] Queens Univ, Dept Chem, Kingston, ON K7L 3N6, Canada

[6] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, State Key Lab High Field Laser Phys, Shanghai 201800, Peoples R China

来源：

CHINESE OPTICS LETTERS | 2019年 / 17卷 / 08期

基金：

中国国家自然科学基金; 上海市自然科学基金;

关键词：

TRANSITION-METAL DICHALCOGENIDES; ULTRAFAST SATURABLE ABSORPTION; MOLYBDENUM-DISULFIDE MOS2; DOPED FIBER LASER; MONO LAYER; SATURATION; ABSORBER;

D O I：

10.3788/COL201917.081901

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Mechanical exfoliation (ME) and chemical vapor deposition (CVD) MoS2 monolayers have been extensively studied, but the large differences of nonlinear optical performance between them have never been clarified. Here, we prepared MoS2 monolayers using ME and CVD methods and investigated the two-photon absorption (TPA) response and its saturation. We found that the TPA coefficient of the ME monolayer was about (1.88 +/- 0.21) x 10(3) cm/GW, nearly two times that of the CVD one at (1.04 +/- 0.15) x 10(3) cm/GW. Furthermore, we simulated and compared the TPA-induced optical pulse modulation in multilayer cascaded structures, which is instructive and meaningful for the design of optical devices such as a beam shaper and optical limiter.

引用

页数：5

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