Tuning the anisotropy and domain structure of Co films by variable growth conditions and seed layers

被引：8

作者：

Mallick, Sougata ^{[1
]}

Mallik, Srijani ^{[1
]}

Singh, Braj Bhusan ^{[1
]}

Chowdhury, Niru ^{[1
,3
]}

Gieniusz, Ryszard ^{[2
]}

Maziewski, Andrzej ^{[2
]}

Bedanta, Subhankar ^{[1
]}

机构：

[1] HBNI, Sch Phys Sci, LNMM, NISER, PO Jatni, Khurja 752050, Odisha, India

[2] Univ Bialystok, Fac Phys, Dept Phys Magnetism, 1L Konstantego Cioikowskiego Str, PL-15245 Bialystok, Poland

[3] Indian Inst Technol, Dept Phys, New Delhi 110016, India

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2018年 / 51卷 / 27期

关键词：

magnetic anisotropy; domain structure; magnetization reversal mechanisms; MAGNETIC-PROPERTIES; MICROSTRUCTURE; MULTILAYERS; RELAXATION; REVERSAL;

D O I：

10.1088/1361-6463/aac880

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Co thin films on Si (1 0 0) substrates with different seed layers (Au or AlOX) have been deposited for variable speed of substrate rotation (R-sub) at room temperature (RT) or 200 degrees C. Hysteresis measurements by magneto optic Kerr effect reveals that the films show growth induced uniaxial anisotropy when prepared without the substrate rotation (i.e. R-sub = 0 rpm). The films prepared at RT show a decrease but non-vanishing uniaxial anisotropy with increase in R-sub . However, high temperature deposition along with substrate rotation leads to formation of isotropic films. The change in anisotropy has been quantitatively investigated using ferromagnetic resonance (FMR) spectroscopy. Further, domain images observed by Kerr microscopy corroborate to the change in anisotropy behavior. We find that by choosing the right combination of seed layer as well as the growth parameters, the anisotropy can be systematically tuned.

引用

页数：8

共 32 条

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