Kinetics of the Electron Beam Induced Crystallization of Amorphous ZrO2 Films Obtained via Ion-Plasma and Laser Sputtering

被引：12

作者：

Bagmut, A. G. ^{[1
]}

Beresnev, V. M. ^{[2
]}

机构：

[1] Natl Tech Univ Kharkiv Polytech Inst, Ul Frunze 21, UA-61002 Kharkov, Ukraine

[2] Kharkov Natl Univ, Pl Svobody 4, UA-61077 Kharkov, Ukraine

来源：

PHYSICS OF THE SOLID STATE | 2017年 / 59卷 / 01期

关键词：

PARAMETERS;

D O I：

10.1134/S1063783417010024

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

The structure and electron beam induced crystallization kinetics of amorphous ZrO2 films obtained via ion-plasma and laser sputtering were compared. The studies were performed by electron diffraction and transmission electron microscopy with recording video films in situ. The effect of an electron beam on an amorphous film in a vacuum was accompanied by the formation of zirconia microcrystals with an FCC lattice. For laser evaporation, the density of crystallization nuclei was beta similar to 10(9) cm(-2), and the characteristic length unit was D-0 similar to 0.48 mu m. For ion-plasma evaporation, beta similar to 10(10) cm(-2), and D-0 similar to 0.06 mu m. The kinetic curves of the crystallization of amorphous films were analyzed using the beta-variant of the Kolmogorov model as a basis.

引用

页码：151 / 155

页数：5

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