Low Temperature Wafer Level Au-Au Bonding for Heterogeneous Integration

被引:0
|
作者
Wang, Fei [1 ]
Dai, Jiayun [1 ]
Cui, Dongyi [1 ]
Kong, Yuechan [1 ]
机构
[1] Nanjing Elect Devices Inst, Sci & Technol Monolith Integrated Circuits & Modu, Nanjing, Peoples R China
来源
2021 IEEE MTT-S INTERNATIONAL MICROWAVE WORKSHOP SERIES ON ADVANCED MATERIALS AND PROCESSES FOR RF AND THZ APPLICATIONS (IMWS-AMP) | 2021年
关键词
low temperature; fine-pitch interconnection; thermo-compression bonding; heterogeneous integration;
D O I
10.1109/IMWS-AMP53428.2021.9643992
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A low-temperature wafer-level solid-solid thermo-compression bonding structure using Au-Au metal is proposed in this paper. Two wafers with gold micro-bumps were bonded at 230 degrees C by thermo-compression. In order to improve bonding quality, an O-2 plasma surface pretreatment method was proposed to activate and increase hydrophobicity of the bonding metal. As a result, well performance and reliability are demonstrated through bonding interface analysis and electrical test, indicate that low temperature Au-Au bonding with fine-pitch bumps and high interconnects density is a promising method for future high density wafer level packaging and heterogeneous integration.
引用
收藏
页码:151 / 153
页数:3
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