Mechanical properties and thermal stability of TiAlN/Ta multilayer film deposited by ion beam assisted deposition

被引:22
作者
Shang, Hongfei [1 ,2 ]
Li, Jian [2 ]
Shao, Tianmin [1 ]
机构
[1] Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China
[2] Wuhan Res Inst Mat Protect, Wuhan 430030, Peoples R China
关键词
TiAlN/Ta; Multilayer film; Ion beam assisted deposition; Thermal stability; Bonding strength; TA-N COATINGS; TI-AL-N; CARBIDE TOOLS; PERFORMANCE; OXIDATION;
D O I
10.1016/j.apsusc.2014.03.099
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
TiAlN/Ta multilayer film with the total thickness of 2 mu m was deposited onto silicon (1 0 0) wafer by ion beam assisted deposition using Ti0.5Al0.5 and Ta as the target materials. Observation of the cross-sectional microstructure and XRD pattern showed that the Ta sub-layer restrained the growth of TiAlN crystal, and decreased the grain size. Nanohardness (H) of the TiAlN/Ta multilayer film was 29% higher and the elastic modulus (E) was 47% higher than that of the TiAlN monolayer film. The critical fracture load (L-c) of 72 mN for the TiAlN/Ta multi layer film was achieved, much higher than that of the monolayer TiAlN film (30 mN), indicated a significant increase of bonding strength. Results of DSC analysis indicated that the TiAlN/Ta multilayer film had the exothermic peak at around 935 degrees C, 75 degrees C above that for the TiAlN monolayer film. Existence of the Ta sub-layers behaved as the barrier layers to prevent oxygen from diffusing into inner layers, resulted in the improvement of thermal stability. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:317 / 320
页数:4
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