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Nanoclusters of Group-III Metal Atoms on Si(111)-7 x 7
被引:2
|作者:
Lee, Geunsik
[2
,3
]
Chung, J. W.
[1
]
Kim, Jai Sam
[1
]
机构:
[1] Pohang Univ Sci & Technol, Dept Phys, Pohang 790784, South Korea
[2] Univ Texas Dallas, Dept Mat Sci & Engn, Dallas, TX 75080 USA
[3] Univ Texas Dallas, Dept Phys, Dallas, TX 75080 USA
关键词:
Group III Metals;
Surface Magic Clusters;
Si(111)-7 x 7;
Simulations;
Density Functional Theory Method;
TRANSMISSION ELECTRON-DIFFRACTION;
SCANNING-TUNNELING-MICROSCOPY;
TOTAL-ENERGY CALCULATIONS;
MAGIC CLUSTERS;
SURFACE;
ADSORPTION;
GROWTH;
NUCLEATION;
DIFFUSION;
THALLIUM;
D O I:
10.1166/jctn.2009.1180
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
The realization of perfectly ordered clusters has been achieved recently for various adsorbates using appropriate substrates such as Si(111)-7 x 7, which has great potential for future nanotechnology applications. In this article, we review the recent experimental and theoretical studies on surface magic clusters (SMCs) formed on Si(111)-7 x 7, focusing on Group III SMCs as a testing ground for an understanding of the underlying chemical and physical mechanisms. Although the atomic geometrical structures of the Al, Ga, and In clusters have been found to be identical, the Thallium cluster, formed at room temperature, is intriguing, complicated mostly by Tl atom's mobile nature. Exploiting accurate ab initio studies, we elucidate the mechanism of SMC formation for the Al, Ga, and In clusters. We also show the Tl cluster's favorable structure and origin, and estimate the hopping frequency of Tl adatoms.
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页码:1311 / 1319
页数:9
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