Nanomechanical resonant structures in silicon nitride: fabrication, operation and dissipation issues

被引:68
作者
Sekaric, L [1 ]
Carr, DW [1 ]
Evoy, S [1 ]
Parpia, JM [1 ]
Craighead, HG [1 ]
机构
[1] Cornell Univ, Cornell Ctr Mat Res, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
nanomechanics; silicon nitride; mechanical quality factor; dissipation;
D O I
10.1016/S0924-4247(02)00149-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the fabrication of silicon nitride mechanical devices with lateral dimensions as small as 50 nm. The measured resonant frequencies of these devices (8.5-171 MHz) are the highest reported for silicon nitride structures. We have employed both electrostatic and piezoelectric excitation of these structures. We have also studied the effects of thin metal films on dissipation in these structures and found that the absence of these metal coatings results in a three to four times higher quality factor of the structures. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:215 / 219
页数:5
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