Coupling computation of the BEM and FDM in 3D capacitance extraction

被引：3
|
作者：
Wei, HC [1 ]
Wang, GH [1 ]
Wang, ZY [1 ]
机构：
[1] Tsing Hua Univ, Dept Comp Sci & Technol, EDA Lab, Beijing 100084, Peoples R China
来源：
2001 4TH INTERNATIONAL CONFERENCE ON ASIC PROCEEDINGS | 2001年
关键词：
D O I：
10.1109/ICASIC.2001.982664
中图分类号：
TP [自动化技术、计算机技术];
学科分类号：
0812 ;
摘要：
When using boundary element method (BEM) to calculate the capacitance of three-dimensional VLSI interconnects with multiple dielectrics, the big error often occurs if some dielectrics don't contain conductor. Therefore, in this paper we present a new algorithm of coupling computation of BEM and finite difference method (FDM) to resolve the problem. This algorithm still use BEM for that dielectrics which contain conductors, but use FDM for that dielectrics which don't contain conductor. Then we couple these equations formed with BEM and FDM to calculate the capacitance. The numerical results indicate that this algorithm reduces calculation error greatly.
引用
收藏
页码：716 / 719
页数：4
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