Relaxation of electrical properties of n-type layers formed by ion milling in epitaxial HgCdTe doped with V-group acceptors

被引:14
作者
Bogoboyashchyy, V. V.
Izhnin, I. I.
Mynbaev, K. D.
Pociask, M.
Vlasov, A. P.
机构
[1] Kremenchuk State Polytech Univ, UA-39614 Kremenchuk, Ukraine
[2] R&D Inst Mat SRC Carat, UA-79031 Lvov, Ukraine
[3] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[4] Rzeshow Univ, Inst Phys, PL-35310 Rzeshow, Poland
[5] Ivan Franko Lviv Natl Univ, UA-79005 Lvov, Ukraine
关键词
CONDUCTIVITY CONVERSION; POINT-DEFECTS; P-HGCDTE; HG0.8CD0.2TE; DIFFUSION;
D O I
10.1088/0268-1242/21/8/028
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The relaxation of electrical properties of As- and Sb-doped HgCdTe epitaxial layers, which were converted into n-type by ion milling, is studied. It is shown that donor complexes formed under ion milling and responsible for p-to-n conductivity type conversion are not stable, and their concentration decreases upon storage even at room temperature. Increasing the temperature of the storage speeds up the relaxation process. It is demonstrated that the relaxation is caused by the disintegration of the donor complexes that starts right after the end of the milling process because of the decrease in the concentration of interstitial mercury atoms, which were generated during the milling. The results presented in the paper are important for the development of the technology of photodetectors based on HgCdTe doped with V-group acceptors.
引用
收藏
页码:1144 / 1149
页数:6
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