Morphology of oxide scales formed on chromium-silicon alloys at high temperatures

被引：20

作者：

Solimani, Ali ^{[1
]}

Nguyen, Thuan ^{[2
]}

Zhang, Jianqiang ^{[2
]}

Young, David J. ^{[2
]}

Schuetze, Michael ^{[1
]}

Galetz, Mathias C. ^{[1
]}

机构：

[1] DECHEMA Forschungsinst, Theodor Heuss Allee 25, D-60486 Frankfurt, Germany

[2] Univ New South Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia

来源：

CORROSION SCIENCE | 2020年 / 176卷 / 176期

关键词：

Chromium; Cr-Si; Chromia; High temperature oxidation; Scale morphology; Single crystal; PURE CHROMIUM; OXIDATION-KINETICS; SELF-DIFFUSION; CR2O3; CR; OXYGEN; MECHANISM; TRANSPORT; GROWTH; FILMS;

D O I：

10.1016/j.corsci.2020.109023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Oxide scales formed on chromium-silicon model alloys at 1200 degrees C in synthetic air were characterized using electron microscopy and diffraction methods. Additions of Si to chromium led to SiO2 growth underneath the chromia scale. The chromia scale was mostly fine-grained, but also contained numerous abnormally large single crystals growing out of the scale surface. Evaluation of mass transport rates shows that growth of the large grains can be supported by gas phase transport of CrO3, but not by lattice diffusion.

引用

页数：9

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