Internal oxidation and mechanical properties of Ru based alloy coatings

被引：7

作者：

Chen, Yung-I ^{[1
]}

Chu, Hsiu-Nuan ^{[1
]}

Chang, Li-Chun ^{[2
,3
]}

Lee, Jyh-Wei ^{[2
,3
]}

机构：

[1] Natl Taiwan Ocean Univ, Inst Mat Engn, Keelung 20224, Taiwan

[2] Ming Chi Univ Technol, Dept Mat Engn, New Taipei City 24301, Taiwan

[3] Ming Chi Univ Technol, Ctr Thin Film Technol & Applicat, New Taipei City 24301, Taiwan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2014年 / 32卷 / 02期

关键词：

METALS; ZR; TI; HF;

D O I：

10.1116/1.4826585

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Ru based laminated coatings with various transition metal solutes were deposited on silicon wafers using a direct current magnetron cosputtering system. After annealing in a 1% O-2-Ar atmosphere at 600 degrees C for 30 min, Ti-Ru, Zr-Ru, Mo-Ru, Hf-Ru, and W-Ru coatings were internally oxidized and maintained a laminated structure, consisting of alternating oxygen-rich and deficient layers stacked along the original growth direction. Conversely, V-Ru and Cr-Ru coatings exhibited external oxidation and failed to maintain the laminated structure after annealing, due to the fast outward diffusion of V and Cr. The variations in crystalline structure and nanohardness of Ru based coatings caused by oxidation after annealing were investigated. (C) 2014 American Vacuum Society.

引用

页数：8

共 27 条

[21]

Oliver W.C., 1992, J MATER RES, V7, P1564, DOI [10.1557/JMR.1992.1564, DOI 10.1557/JMR.1992.1564]

[22] Synthesis, structural and mechanical characterization of sputtered tungsten oxide coatings [J].

Parreira, NMG ;

Carvalho, NJM ;

Cavaleiro, A .

THIN SOLID FILMS, 2006, 510 (1-2) :191-196

[23]

Sato S., 2007, U.S. Patent, Patent No. 7189656

[24]

Shoji T., 2003, U.S. Patent, Patent No. 6511523

[25] Oxidation behavior of molybdenum nitride coatings [J].

Solak, N ;

Ustel, F ;

Urgen, M ;

Aydin, S ;

Cakir, AF .

SURFACE & COATINGS TECHNOLOGY, 2003, 174 :713-719

[26]

WAGNER C, 1959, Z ELEKTROCHEM, V63, P772

[27] First-principles studies of structural stabilities and enthalpies of formation of refractory intermetallics: TM and TM3 (T = Ti, Zr, Hf; M = Ru, Rh, Pd, Os, Ir, Pt) [J].

Xing, Weiwei ;

Chen, Xing-Qiu ;

Li, Dianzhong ;

Li, Yiyi ;

Fu, C. L. ;

Meschel, S. V. ;

Ding, Xueyong .

INTERMETALLICS, 2012, 28 :16-24

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