Interface study of W/Si multilayers with increasing number of periods

被引:1
作者
Jergel, M [1 ]
Majkova, E [1 ]
Holy, V [1 ]
Luby, S [1 ]
Senderak, R [1 ]
机构
[1] MASARYK UNIV,FAC SCI,DEPT SOLID STATE PHYS,CS-61137 BRNO,CZECH REPUBLIC
来源
NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA D-CONDENSED MATTER ATOMIC MOLECULAR AND CHEMICAL PHYSICS FLUIDS PLASMAS BIOPHYSICS | 1997年 / 19卷 / 2-4期
关键词
D O I
10.1007/BF03041003
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The X-ray reflectivity and diffuse-scattering measurements at grazing incidence on W/Si multilayers with increasing number of periods N from 3 to 15 were performed using the CuK alpha(1) radiation. The Fresnel optical computational code and distorted-wave Born approximation were used to evaluate the results. The multilayer Bragg interferences are observed from N = 6. The reflectivity on the 1st Bragg maximum increases from 20% to 55% on increasing N from 6 to 15. The r.m.s. interface roughness of 0.65nm does not change with N. A model of vertically correlated interface profiles was successfully used to simulate the diffuse scattering results and confirmed a negligible cumulative interface roughness upwards the multilayers. The lateral correlation length of 10 nm is independent of M. An additional roughness component of very large correlation length (''waviness'') had to be included to obtain self-consistent simulations of the sample and detector scans for N greater than or equal to 9. A gradual increase of the fractal parameter of the interface profiles from h = 0.15 for N = 3 to h = 0.75 for N = 15 is the most pronounced effect of increasing N and implies the loss of the fractal behaviour.
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收藏
页码:439 / 445
页数:7
相关论文
共 8 条
[1]   X-RAY REFLECTION FROM ROUGH LAYERED SYSTEMS [J].
HOLY, V ;
KUBENA, J ;
OHLIDAL, I ;
LISCHKA, K ;
PLOTZ, W .
PHYSICAL REVIEW B, 1993, 47 (23) :15896-15903
[2]   INTERFACE ROUGHNESS IN SURFACE-SENSITIVE X-RAY-METHODS [J].
HOLY, V ;
BAUMBACH, T ;
BESSIERE, M .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (4A) :A220-A226
[3]  
HOLY V, 1995, APPL PHYS A-MATER, V60, P93, DOI 10.1007/BF01577620
[4]   NONSPECULAR X-RAY REFLECTION FROM ROUGH MULTILAYERS [J].
HOLY, V ;
BAUMBACH, T .
PHYSICAL REVIEW B, 1994, 49 (15) :10668-10676
[5]   INTERFACE STUDY OF W-SI/SI AND OBLIQUELY DEPOSITED W/SI MULTILAYERS BY GRAZING-INCIDENCE HIGH-RESOLUTION X-RAY-DIFFRACTION [J].
JERGEL, M ;
HOLY, V ;
MAJKOVA, E ;
LUBY, S ;
SENDERAK, R .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1995, 28 (4A) :A241-A245
[6]   DETERMINATION OF THE STATIC SCALING EXPONENT OF SELF-AFFINE INTERFACES BY NONSPECULAR X-RAY-SCATTERING [J].
SALDITT, T ;
METZGER, TH ;
BRANDT, C ;
KLEMRADT, U ;
PEISL, J .
PHYSICAL REVIEW B, 1995, 51 (09) :5617-5627
[7]   DETERMINATION OF INTERFACIAL ROUGHNESS CORRELATION IN W/C MULTILAYER FILMS - COMPARISON USING SOFT AND HARD X-RAY-DIFFRACTION [J].
SAVAGE, DE ;
PHANG, YH ;
ROWND, JJ ;
MACKAY, JF ;
LAGALLY, MG .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (10) :6158-6164
[8]   X-RAY AND NEUTRON-SCATTERING FROM ROUGH SURFACES [J].
SINHA, SK ;
SIROTA, EB ;
GAROFF, S ;
STANLEY, HB .
PHYSICAL REVIEW B, 1988, 38 (04) :2297-2311