Graphoepitaxial Assembly of Block Copolymer for Bending Stripe Patterns

被引：2

作者：

Huh, June ^{[1
]}

Kim, Mi-Jeong ^{[2
]}

Park, Jong-Wan ^{[3
]}

机构：

[1] Korea Univ, Dept Chem & Biol Engn, 145 Anam Ro, Seoul 02841, South Korea

[2] Samsung Adv Inst Technol, Mat Res Ctr, 130 Samsung Ro, Suwon 16678, Gyeonggi Do, South Korea

[3] Seoul Natl Univ, Coll Med, Dept Biomed Sci, BK21 Plus Educ Program, Seoul 03080, South Korea

来源：

MACROMOLECULAR THEORY AND SIMULATIONS | 2019年 / 28卷 / 04期

基金：

新加坡国家研究基金会;

关键词：

block copolymer; directed self-assembly; monte carlo simulation; nanopatterning; FILMS;

D O I：

10.1002/mats.201900009

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The formation of bend patterns using block copolymer (BCP) lamellae within trench-type groove patterned with bend geometry is simulated by using a Monte Carlo simulation and a strong segregation theory. A tolerance of curvatures at the bend corners of the guide pattern for the formation of bent lamellae is proposed. It is found from the simulation and the strong segregation theory that the tolerance for the difference in curvature radii of two bend corners for the well-patterned lamellar bends is proportional to the inverse of the trench width in the straight region.

引用

页数：5

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