Atomic level control over surface species via a molecular precursor approach: Isolated Cu(I) sites and Cu nanoparticles supported on mesoporous silica

被引:53
作者
Fujdala, KL
Drake, IJ
Bell, AT
Tilley, TD [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem & Chem Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Chem Sci Div, Berkeley, CA 94720 USA
关键词
D O I
10.1021/ja048701+
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A nonaqueous molecular precursor grafting approach was employed for the generation of well-defined surface structures featuring Cu on a mesoporous silica support. X-ray absorption measurements (XANES and EXAFS) were used to determine that [CuOSi(OtBu)3]4 provided 100% isolated Cu(I) sites upon grafting (without thermal treatment), whereas [CuOtBu]4 gave isolated species with most of the original Cu-O-Cu linkages intact, but in a more relaxed straight chain form. Upon heating under inert conditions, the vast majority of Cu in the materials from [CuOSi(OtBu)3]4 remained as isolated Cu(I) sites (up to 88% isolation), with significant stabilization provided from the -OSi(OtBu)3 ligands. In stark contrast, ∼100% of the Cu in the materials generated from [CuOtBu]4 was readily reduced upon heating, forming isolated Cu metal particles with an average diameter of 0.7 nm. Copyright © 2003 American Chemical Society.
引用
收藏
页码:10864 / 10866
页数:3
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