Influence of RF sputtering power on structural and optical properties of Nb2O5 thin films

被引:38
作者
Al-Baradi, Ateyyah M. [1 ]
El-Nahass, M. M. [2 ]
Hassanien, A. M. [3 ]
Atta, A. A. [1 ,2 ]
Alqahtani, Mohammed S. [4 ]
Aldawsari, Abeer O. [1 ]
机构
[1] Taif Univ, Fac Sci, Dept Phys, At Taif 888, Saudi Arabia
[2] Ain Shams Univ, Fac Educ, Dept Phys, Cairo 11757, Egypt
[3] Shaqra Univ, Fac Sci & Humanity Studies Al Quwayiyah, Dept Phys, Al Quwayiyah 11971, Saudi Arabia
[4] King Saud Univ, Dept Phys & Astron, Riyadh 11451, Saudi Arabia
来源
OPTIK | 2018年 / 168卷
关键词
Nb2O5 thin film; RF sputtering power; Optical properties; Photoluminescence; NIOBIUM OXIDE-FILMS; PLASMA-DEPOSITED TA2O5; ELECTROCHROMIC PROPERTIES; ELECTRICAL-PROPERTIES; REFRACTIVE-INDEX; PHOTOLUMINESCENCE; PARAMETERS; MORPHOLOGY; STABILITY; BEHAVIOR;
D O I
10.1016/j.ijleo.2018.05.020
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this research, Niobium oxide (Nb2O5) films were deposited on glass substrates using RF sputtering technique. The effect of RF sputtering powers (150, 175 and 200 W) on the structural, and optical properties of as-deposited and annealed Nb2O5 thin films were examined using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), UV-vis-NIR double beam spectrophotometer and Photoluminescence (PL) measurements. X-ray diffraction results revealed that the as-deposited and annealed films have polycrystalline structure. The optical parameters such as absorption coefficient, optical band gap energy, refractive index, dielectric constants and oscillators' parameters are estimated. The dispersion parameters are evaluated and analyzed according to a single oscillator model.
引用
收藏
页码:853 / 863
页数:11
相关论文
共 57 条
[1]   Enhancement of the refractive index of sputtered zinc oxide thin films through doping with Fe2O3 [J].
Al-Kuhaili, M. F. ;
Durrani, S. M. A. ;
El-Said, A. S. ;
Heller, R. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 690 :453-460
[2]   Study of topological morphology and optical properties of SnO2 thin films deposited by RF sputtering technique [J].
Alhuthali, A. ;
El-Nahass, M. M. ;
Atta, A. A. ;
Abd El-Raheem, M. M. ;
Elsabawy, Khaled M. ;
Hassanien, A. M. .
JOURNAL OF LUMINESCENCE, 2015, 158 :165-171
[3]   Effect of thermal annealing on structural, optical and electrical properties of transparent Nb2O5 thin films [J].
Atta, A. A. ;
El-Nahass, M. M. ;
Hassanien, A. M. ;
Elsabawy, Khaled M. ;
Abd El-Raheem, M. M. ;
Alhuthali, A. ;
Alomariy, Sultan E. ;
Algamdi, M. S. .
MATERIALS TODAY COMMUNICATIONS, 2017, 13 :112-118
[4]   ANOMALOUS OPTICAL ABSORPTION LIMIT IN INSB [J].
BURSTEIN, E .
PHYSICAL REVIEW, 1954, 93 (03) :632-633
[5]   Effect of postdeposition annealing on the structure, composition, and the mechanical and optical characteristics of niobium and tantalum oxide films [J].
Cetinoergue-Goldenberg, Eda ;
Klemberg-Sapieha, Jolanta-Ewa ;
Martinu, Ludvik .
APPLIED OPTICS, 2012, 51 (27) :6498-6507
[6]   Thermal oxidation of tantalum films at various oxidation states from 300 to 700 °C -: art. no. 114908 [J].
Chandrasekharan, R ;
Park, I ;
Masel, RI ;
Shannon, MA .
JOURNAL OF APPLIED PHYSICS, 2005, 98 (11)
[7]   Photoluminescence of undoped and Ce-doped SnO2 thin films deposited by sol-gel-dip-coating method [J].
Chen, Shuai ;
Zhao, Xiaoru ;
Xie, Haiyan ;
Liu, Jinming ;
Duan, Libing ;
Ba, Xiaojun ;
Zhao, Jianlin .
APPLIED SURFACE SCIENCE, 2012, 258 (07) :3255-3259
[8]   The optical and structural properties of amorphous Nb2O5 thin films prepared by RF magnetron sputtering [J].
Coskun, Ozlem Duyar ;
Demirel, Selen .
APPLIED SURFACE SCIENCE, 2013, 277 :35-39
[9]  
Cullity BD, 2014, ELEMENTS XRAY DIFFRA, V3rd
[10]  
DIGIULIO M, 1993, PHYS STATUS SOLIDI A, V136, pK101, DOI 10.1002/pssa.2211360236