Nonuniform defect distribution in GaN thin films examined by cathodoluminescence

被引:8
作者
Goldys, EM [1 ]
Godlewski, M
机构
[1] Macquarie Univ, Semicond Sci & Technol Labs, N Ryde, NSW 2109, Australia
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2000年 / 70卷 / 03期
关键词
D O I
10.1007/s003390050055
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Room-temperature cathodoluminescence depth-profiling studies of GaN films grown on sapphire and on SiC are reported. The spectral characteristics were quantitatively analysed taking into account reabsorption effects. We show that whereas GaN films grown on sapphire show a uniform defect distribution, in GaN grown on SiC the defect density is clearly nonuniform and new, low-energy lines appear in emission from deeper layers in the film.
引用
收藏
页码:329 / 331
页数:3
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