Glass micromachining using the VUVF2 laser

被引：8

作者：

Dyer, PE ^{[1
]}

Maswadi, SM ^{[1
]}

Snelling, HV ^{[1
]}

Walton, CD ^{[1
]}

机构：

[1] Univ Hull, Dept Phys, Kingston Upon Hull HU6 7RX, N Humberside, England

来源：

PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS | 2002年 / 4637卷

关键词：

VUV; F-2; laser; micromachining; glass; ablation; surface roughness;

D O I：

10.1117/12.470626

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Theoretical and experimental studies of the surface quality in 157nm F-2 laser-ablated glasses are reported. Limitations set by statistical fluctuations in the multi-mode beam and by stationary beam non-uniformity are explored together with materials issues such as laser- induced surface cracking. Experimental work on ablating polymethylmethacrylate (PMMA), used as a low threshold medium for recording of the VUV beam, and soda lime glass are described. Use is made of the probe beam deflection technique to determine ablation thresholds, and a variety of methods adopted for characterising and assessing the quality of ablated surfaces e.g. scanning-electron microscopy, mechanical and optical interference profiling and atomic force microscopy. Preliminary roughness measurements are compared with theoretical expectations and the implication for glass micromachining with the F-2 laser discussed.

引用

页码：218 / 227

页数：10

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