Diffraction phase microscopy: monitoring nanoscale dynamics in materials science [Invited]

被引:47
作者
Edwards, Chris [1 ,2 ]
Zhou, Renjie [1 ,2 ]
Hwang, Suk-Won [3 ]
McKeown, Steven J. [1 ]
Wang, Kaiyuan [1 ]
Bhaduri, Basanta [2 ]
Ganti, Raman [4 ]
Yunker, Peter J. [4 ,5 ]
Yodh, Arjun G. [4 ]
Rogers, John A. [3 ]
Goddard, Lynford L. [1 ]
Popescu, Gabriel [2 ]
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Micro & Nanotechnol Lab, Photon Syst Lab, Urbana, IL 61801 USA
[2] Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Elect & Comp Engn, Quantitat Light Imaging Lab, Urbana, IL 61801 USA
[3] Univ Illinois, Frederick Seitz Mat Res Lab, Dept Mat Sci & Engn, Rogers Res Grp, Urbana, IL 61801 USA
[4] Univ Penn, Dept Phys & Astron, Philadelphia, PA 19104 USA
[5] Harvard Univ, Sch Engn & Appl Sci, Cambridge, MA 02138 USA
基金
奥地利科学基金会;
关键词
DIGITAL HOLOGRAPHIC MICROSCOPY; WHITE-LIGHT; ELECTRONICS; INTERFEROMETRY; TRANSISTORS; PRINCIPLES; CONTRAST; SYSTEMS;
D O I
10.1364/AO.53.000G33
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Quantitative phase imaging (QPI) utilizes the fact that the phase of an imaging field is much more sensitive than its amplitude. As fields from the source interact with the specimen, local variations in the phase front are produced, which provide structural information about the sample and can be used to reconstruct its topography with nanometer accuracy. QPI techniques do not require staining or coating of the specimen and are therefore nondestructive. Diffraction phase microscopy (DPM) combines many of the best attributes of current QPI methods; its compact configuration uses a common-path off-axis geometry which realizes the benefits of both low noise and single-shot imaging. This unique collection of features enables the DPM system to monitor, at the nanoscale, a wide variety of phenomena in their natural environments. Over the past decade, QPI techniques have become ubiquitous in biological studies and a recent effort has been made to extend QPI to materials science applications. We briefly review several recent studies which include real-time monitoring of wet etching, photochemical etching, surface wetting and evaporation, dissolution of biodegradable electronic materials, and the expansion and deformation of thin-films. We also discuss recent advances in semiconductor wafer defect detection using QPI. (C) 2014 Optical Society of America
引用
收藏
页码:G33 / G43
页数:11
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