Dose rate effects in bipolar oxides: Competition between trap filling and recombination

被引:46
作者
Boch, J. [1 ]
Saigne, F.
Touboul, A. D.
Ducret, S.
Carlotti, J. -F.
Bernard, M.
Schrimpf, R. D.
Wrobel, F.
Sarrabayrouse, G.
机构
[1] Univ Montpellier 2, CEM2, UMR CNRS 5507, F-34095 Montpellier 5, France
[2] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
[3] Univ Nice, LPES, CRESA, EA1174, F-06108 Nice 2, France
[4] CNRS, LAAS, F-31077 Toulouse 04, France
关键词
D O I
10.1063/1.2210293
中图分类号
O59 [应用物理学];
学科分类号
摘要
Predicting the low-dose-rate degradation of bipolar technologies is one of the main issues for circuits intended for use in the ionizing-radiation environment of space because of the enhanced low-dose-rate sensitivity (ELDRS). In this letter, ELDRS is shown to be related to competition between trapping and recombination of radiation-induced carriers in the oxide. The presented model is shown to be in good agreement with experimental data. It is also shown that this effect is strongly dependent-on the oxide quality. (c) 2006 American Institute of Physics.
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页数:3
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