Relation Between the Semiconducting Properties of a Passive Film and Reduction Reaction Rates

被引:103
作者
Harrington, Scott P. [1 ]
Devine, Thomas M. [1 ]
机构
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
关键词
capacitance; chromium; chromium alloys; electrochemical impedance spectroscopy; metallic thin films; molybdenum alloys; nickel alloys; reaction rate constants; reduction (chemical); semiconductor thin films; CONSTANT PHASE ELEMENT; SULFURIC-ACID-SOLUTION; ELECTRONIC-STRUCTURE; ELECTROCHEMICAL IMPEDANCE; FREQUENCY-DEPENDENCE; ELEVATED-TEMPERATURE; LOCALIZED CORROSION; CR ALLOYS; CHROMIUM; BEHAVIOR;
D O I
10.1149/1.3077576
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The films forming on pure chromium and Alloy C22 in aqueous borate buffer were investigated with potential polarization scans, electrochemical impedance spectroscopy, and Mott-Schottky analysis. The capacitances of both films were frequency dependent, and a constant phase element (CPE) best described the frequency dispersion. Cathodic polarization scans were used to assess the accuracy of flatband potential values calculated from Mott-Schottky tests using different models to extract an effective capacitance from a CPE. It was found that using effective capacitances calculated with an expression developed by Brug [J. Electroanal. Chem., 176, 275 (1984)] led to flatband potentials that closely agreed with cathodic polarization scans. Both films were found to be n-type, and flatband potentials of -1.217 and -0.617 V vs standard hydrogen electrode were found for Cr and Alloy C22, respectively.
引用
收藏
页码:C154 / C159
页数:6
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