Optical emission generated from silicon under dual-wavelength femtosecond double-pulse laser irradiation

被引：37
作者：
Chen, Anmin [1 ,2 ,3 ]
Wang, Ying [1 ,2 ]
Sui, Laizhi [1 ,2 ]
Li, Suyu [1 ,2 ]
Li, Shuchang [1 ,2 ]
Liu, Dunli [1 ,2 ]
Jiang, Yuanfei [1 ,2 ]
Jin, Mingxing [1 ,2 ]
机构：
[1] Jilin Univ, Inst Atom & Mol Phys, Changchun 130012, Peoples R China
[2] Jilin Univ, Jilin Prov Key Lab Appl Atom & Mol Spect, Changchun 130012, Peoples R China
[3] Jilin Univ, Inst Theoret Chem, Changchun 130012, Peoples R China
来源：
OPTICS EXPRESS | 2015年 / 23卷 / 19期
基金：
中国国家自然科学基金; 中国博士后科学基金;
关键词：
INDUCED BREAKDOWN SPECTROSCOPY; SIGNAL ENHANCEMENT; METALLIC SAMPLES; ABLATION; PLASMA; DYNAMICS; DELAY;
D O I：
10.1364/OE.23.024648
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In femtosecond double-pulse laser-induced breakdown spectroscopy, collinear double-pulse performance is investigated experimentally using various laser wavelength combinations of 800 nm and 400 nm Ti: sapphire lasers. The induced plasma emission line collected by BK7 lenses is the Si (I) at 390.55 nm. The double-pulse time separation ranges from -300 ps to 300 ps. The line intensity is dependent on the time separation of the dual-wavelength femtosecond double-pulse, and its behavior is unlike that of single-wavelength femtosecond double-pulses. Optical emission intensity can be enhanced by selecting appropriate time separation between sub-pulses. This result is particularly advantageous in the context of femtosecond laser-induced breakdown spectroscopy. (C) 2015 Optical Society of America
引用
收藏
页码：24648 / 24656
页数：9
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