Interfacial structure of epitaxial SrTiO3 on Si: experiments and simulations

被引:7
作者
Wang, X. F. [1 ]
Wang, Juan [1 ]
Li, Quan [1 ]
Moreno, M. S. [2 ]
Zhou, X. Y. [3 ]
Dai, J. Y. [3 ]
Wang, Y. [3 ]
Tang, D. [4 ]
机构
[1] Chinese Univ Hong Kong, Dept Phys, Shatin, Hong Kong, Peoples R China
[2] Ctr Atom Bariloche, Dept Mat, RA-8400 San Carlos De Bariloche, Rio Negro, Argentina
[3] Hong Kong Polytech Univ, Dept Appl Phys, Hong Kong, Hong Kong, Peoples R China
[4] FEI Co, NL-5600 KA Eindhoven, Netherlands
关键词
THIN-FILMS; SILICON; SPECTROSCOPY; OXIDES;
D O I
10.1088/0022-3727/42/8/085409
中图分类号
O59 [应用物理学];
学科分类号
摘要
The interfacial structure of epitaxial SrTiO3 (STO) on Si has been investigated using combined experimental and theoretical approaches. Together with high resolution high angle annular dark field image, spatially resolved electron energy loss spectroscopy (EELS) acquired across the STO/Si interface reveals an interfacial region of 1-2 monolayer thickness, which is lacking in Sr, but contains Ti, Si and O. General agreement exists between the experimental EELS results and the simulated ones, which are obtained based on a classical molecular dynamics interface model, disclosing a gradual change in the local atomic coordination symmetry and possible defect incorporation at the interface.
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页数:4
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