Interfacial energy calculation of bcc/fcc interface

被引:12
作者
Gotoh, Y [1 ]
Entani, S [1 ]
Kawanowa, H [1 ]
机构
[1] Sci Univ Tokyo, Dept Mat Sci & Technol, Chiba 2788510, Japan
关键词
reflection high-energy electron diffraction (RHEED); interface states; surface structure; morphology; roughness; and topography; epitaxy; metal-metal interfaces; metallic films;
D O I
10.1016/S0039-6028(02)01277-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In order to explain the atomic arrangement of fcc metals with 1 ML thickness deposited on bcc(1 1 0) surface, Such as Mo and W, the calculation of the interfacial energy between the fcc(1 1 1) monolayer and the bcc(1 1 0) Surface was carried out using the Morse potential. Interactions of deposited fee atoms with neighboring fcc atoms on the surface and with Mo atoms of the substrate within a constant distance were considered. First, the interfacial energy of the structure with a rigid fcc(1 1 1) monolayer on the substrate was calculated by varying the relative rotation angle and the atomic diameter ratio of bcc to fee. The calculations showed that the energy minimum appears at Nishiyama-Wassermann and Kurdjumov-Sachs orientations at specific values of the atomic diameter ratio, which can be used to predict epitaxial orientation for various fcc/bec combinations. Second, the calculations can interpret surface superstructures Such as the 10 x 4 structure appearing in the Pb monolayer deposited on the Mo(1 1 0) surface with a coincident site lattice structure deformed slightly from the fee(1 1 1) plane, as observed by RHEED experiment. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:401 / 405
页数:5
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