Advanced SiGe BiCMOS Technology for Multi-Mrad Electronic Systems

被引:25
|
作者
Fleetwood, Zachary E. [1 ]
Kenyon, Eleazar W. [1 ]
Lourenco, Nelson E. [1 ]
Jain, Shaleen [1 ]
Zhang, En Xia [2 ]
England, Troy D. [1 ]
Cressler, John D. [1 ]
Schrimpf, Ronald D. [2 ]
Fleetwood, Daniel M. [2 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
关键词
SiGe HBT; Silicon-Germanium (SiGe) BiCMOS; total ionizing dose (TID); proton irradiation; radiation; Silicon-Germanium (SiGe); shallow trench isolation (STI); Europa; saturation; turn-around; dose-enhancement; PROTON TOLERANCE;
D O I
10.1109/TDMR.2014.2331980
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The total ionizing dose response of both CMOS transistors and SiGe HBTs implemented without utilizing any radiation hardening by design techniques in Jazz Semiconductor's SBC-18-HXL BiCMOS technology platform is evaluated. The SiGe HBTs remain functional up to the 6 Mrad(SiO2) dose levels needed to support multi-Mrad exploration missions such as NASA's Europa mission. The CMOS devices are also functional to this extreme total dose. The nFETs exhibit significantly reduced shallow trench isolation leakage compared with nFETs implemented in prior SiGe BiCMOS processes. Both nFETs and pFETs show negligible transconductance and on-current degradation. We conclude that this SiGe process technology is a potential candidate for implementing reliable and survivable multi-Mrad total ionizing dose-hard electronic systems.
引用
收藏
页码:844 / 848
页数:5
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